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The Effect of Environmental Exposure on the Structure and Properties of Thin Films for MEMS Applications
A PhD Seminar by Yimeng Yang, Microelectronic Research Group, School of EE&C Engineering, UWA
| What | |
|---|---|
| When |
2007-10-09 13:00
2007-10-09 14:00
2007-10-09 from 13:00 to 14:00 |
| Where | Billings Room 3.04 - EECE, UWA |
| Contact Name | Professor John Dell |
| Contact Email | johnd@ee.uwa.edu.au |
| Contact Phone | 6488 3112 |
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ABSTRACT:
This presentation introduces a PhD student research proposal on effect of environmental exposure on the structure and properties of thin films for MEMS applications. MEMS technology can be implemented using a number of materials. Common thin film materials for MEMS include SiNx, SiOx, SiC, Ge etc., owing to their excellent mechanical performances, stable chemical and structural properties, good fabricatability into various structures or special functional properties. However, determined intrinsically by the synthesis process, i.e. PECVD SiNx thin films are structurally amorphous and chemical non-stoichiometric to Si3N4. Such materials exhibit very different properties from the better known bulk crystalline, stoichiometric Si3N4.
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